Used CVD Equipment
309 resultsVertical Furnace Oxide Process Version: 200 mm Vintage: 01.08.1999 Comments: 1 Process Oxide 2 Wafer Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPVD Cluster tool Version: 200 MM Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPVD Version: 200 MM Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details-De-installed, warehoused, can be inspected by appointment -Was in working condition prior to de-installation Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDeinstalled, warehoused. 120V 50 HZ SETUP Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details-Double Stack SRD (Set up for solar wafer use) -in excellent , operational condition -Has CE mark -See attache Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPoly / K type Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPVD cluster tool with 6 chambers (Used for Al, Ti, NiV and AG) Version: 200 mm Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFill Sputter Deposition System Version: 125 mm Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVertical LPCVD Furnace Version: 300 mm Year(s) : 2004 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCD-60 Super Catalytic Decomposition System Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLoad-locked, fully automated (CX 2003A controller) High throughput Cassette-to-cassette vertical react Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVTP 1500 LH LPCVD (SiN) Reactor is Configured for SiN processing of 200 mm wafers. System Is fully automated w Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details4504 Four Stack LPCVD Reactor configured for PolySi, Silicon Nitride, SiO2/PSG/BPSG, and TEOS/PTEOS/BPTEOS. Sy Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Temescal Control System (TCS) - Inficon Model XTC/3 Process Controller - 6 KW Ebeam Power Supply - Lift-o Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhotovoltaics diffusion oxidation furnace with 2 oxidation tubes NEW STILL IN ORIGINAL CRATES Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details200mm Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMax Wafer: 200mm System Dimensions: 23 x 32 x 60 inches Configuration: 8" wafer capable, single chamber Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Single PECVD chamber, non load-locked - Input Power: 208V, 3ph - Heated Platen up to 400 C - Max Wafer Size Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Substrate Size Up To 4" - Max Temperature: 1100°C - Base Pressure:<10 - Process Gases: Argon, Hydrogen, Meth Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSV-9040-T14 Description PVD: Sputter Location : ASIA (North East)
Price : On request
More detailsPVD:Sputter/6in Location : ASIA (North East)
Price : On request
More detailsCVD:APCVD/6in Location : ASIA (North East)
Price : On request
More detailsFUR:LPCVD/6in Location : ASIA (North East)
Price : On request
More details<b>1x, Novellus, Concept 1 CVD</b> 200mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.