Used CVD Equipment
217 resultsWAFER SIZE 12 Location : EUROPE (Western and Northern)
Price : On request
More detailsIon Implanter/8in Year(s) : 2004 Location : ASIA (North East)
Price : On request
More detailsDiffusion LPCVD Nitride x01 Reactor Wafer Size 8 Location : EUROPE (Western and Northern)
Price : On request
More detailsPECVD (Chemical Vapor Deposition) WAFER SIZE 12 Location : EUROPE (Western and Northern)
Price : On request
More details8 inch substrate. Manual load/unload. Vacuum function. Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMaterials Research Corp. 8671 RF Sputtering Vacuum Chamber Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSputtering System 2400 – 8L Load Lock Sputter Deposition Coater Comes with AE MDX 1K RF Power Generator Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Maximum 150 mm Set Size 125 mm Controller Type Microprocessor Controller Type Contr Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsENDURA IMP Ti/TiN PVD 200 mm SNNF Wide body L/L HP Robots 2 x OD 2 x PCII 2 x IMP TiN 1 x IMP Ti 2 x CTI 96 Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsTool Status: Deinstalled and crated and in storage. (March 2023) Wafer Size 300 mm Process PE-ALD System Softw Year(s) : 2010 Location : EUROPE (Western and Northern)
Price : On request
More detailsTyp: 10000186 UV 300/400 50 Hz 3” Chuck, 4” x 4” Mask Holder Objectiv Leitz 5x 0,09; 10x 0,20; 20x 0,40; 32 Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsThis furnace can handle wafers up to 150mm Configuration: N2 - 1500 l/min N2 - 660 l/min Forming Gas 660l/ Year(s) : 1999 Location : EUROPE (Western and Northern)
Price : On request
More detailsLow Energy Implanter 200mm Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsIon implanter Year(s) : 2013 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailspvd: Sputter/4in. Year(s) : 2012 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD/4in. Year(s) : 2007 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD/6in Model AIX2800G4 Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailsCVD: APCVD Maker AMAYA Model AEC2250SP-296 Location : ASIA (North East)
Price : On request
More detailsCVD: APCVD Year(s) : 1998 Location : ASIA (North East)
Price : On request
More detailsPVD:Sputter Maker TEAMS CORPORATION Year(s) : 2018 Location : ASIA (North East)
Price : On request
More detailsDescription CVD Deposition with ECR source Wafer Size Range Minimum 50 mm Maximum 300 mm Controller T Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTEL NEXX APOLLO HP PVD SYSTEM SPT03 RFL02 SemiGEAR Reflow Tool Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAMAT, 300mm Tool ID: TC-TSA-01 Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsThis furnace can handle wafers up to 150mm Configuration: N2 - 1500 l/min N2 - 660 l/min Forming Gas 660l Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.