Used CVD Equipment
217 resultsThis furnace can handle wafers up to 150mm Configuration: N2 - 1500 l/min N2 - 660 l/min Forming Gas 660l Year(s) : 1994 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD: APCVD/6in Location : ASIA (North East)
Price : On request
More detailsReticle Handler Model RSR160 Location : EUROPE (Western and Northern)
Price : On request
More detailsManufacturer Noevllus DKN config Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More details• Process: PECVD iN,SiO2, i-a-Si, SiON and N+ a-Si • SoFware Version: AKT7.3 • System Power RaNng: 208 VAC 3-P Year(s) : 2005 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD Model Vector Express Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD: SL W-CVD/12in Year(s) : 2001 Location : ASIA (North East)
Price : On request
More detailsCVD/12in Year(s) : 2021 Location : ASIA (North East)
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More detailsPVD/12inch Year(s) : 2003 Location : ASIA (North East)
Price : On request
More details- Temescal Control System (TCS) - Inficon Model XTC/3 Process Controller - 6 KW Ebeam Power Supply - Lift-o Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsConfiguration: - MAG7 Brooks Robots - MC3 Novellus Module controller - Pfeiffer Turbo and turbo controller - Location : EUROPE (Western and Northern)
Price : On request
More detailsOptical Microscope, 300mm Cold. Not working parts include: Tango Controller (Microscope Stage controller Joy Location : EUROPE (Western and Northern)
Price : On request
More details3 Chambers In Fab, Warm Idle Software version: 2.0405 CIM: E84, SECS-GEM. GEM300, Interface A Hardware Configu Year(s) : 2013 Location : EUROPE (Western and Northern)
Price : On request
More detailsFully Automatic Prober with FOUP Capability WAFER SIZE 300mm Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD/PVD Location : EUROPE (Western and Northern)
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More detailsTool Status: Connected Wafer Size: 300 mm Asset Description: DESPATCH Bake-out Cabinet Oven CIM: NONE Proc Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsCATHODES: 2 magnetron targets 200mm diameter. SUBSTRATE TRANSPORT LOAD LOCK: for 150mm diameter substrates. SU Location : EUROPE (Western and Northern)
Price : On request
More detailsDiffusion furnace (OX) Year(s) : 2000 Location : ASIA (North East)
Price : On request
More details200mm Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsNitride CVD Furnace Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTrias CVD PECVD-Oxynitride Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size: 12" Process: Etch OCD Measuring Location : EUROPE (Western and Northern)
Price : On request
More detailsDescription PECVD TEOS with Load Lock Wafer Size Range Maximum 200 mm Process PECVD & TEOS Controller T Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFurnace LPCVD-Si3N4 WAFER SIZE 12 Year(s) : 2015 Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER SIZE 300mm Year(s) : 2009 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.