Used CVD Equipment
309 resultsGen 6 PEVCD Chamber - Accessories Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLow Energy Implanter 200mm Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCVD: MOCVD Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailspvd: Sputter/4in. Year(s) : 2012 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD/4in. Year(s) : 2007 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD/6in Model AIX2800G4 Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailsTEL NEXX APOLLO HP PVD SYSTEM SPT03 RFL02 SemiGEAR Reflow Tool Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAMAT, 300mm Tool ID: TC-TSA-01 Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Process: PECVD iN,SiO2, i-a-Si, SiON and N+ a-Si • SoFware Version: AKT7.3 • System Power RaNng: 208 VAC 3-P Year(s) : 2005 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD: SL W-CVD/12in Year(s) : 2001 Location : ASIA (North East)
Price : On request
More detailsCVD/12in Year(s) : 2021 Location : ASIA (North East)
Price : On request
More detailsPVD/12inch Year(s) : 2003 Location : ASIA (North East)
Price : On request
More detailsFully Automatic Prober with FOUP Capability WAFER SIZE 300mm Location : EUROPE (Western and Northern)
Price : On request
More detailsCATHODES: 2 magnetron targets 200mm diameter. SUBSTRATE TRANSPORT LOAD LOCK: for 150mm diameter substrates. SU Location : EUROPE (Western and Northern)
Price : On request
More detailsFurnace LPCVD-Si3N4 WAFER SIZE 12 Year(s) : 2015 Location : EUROPE (Western and Northern)
Price : On request
More details- Automatic Mask Aligner - Top Side Alignment (TSA) - 4" Vacuum Chuck (inquire for other sizes) - 5" x 5" Mask Year(s) : 2010 Location : EUROPE (Western and Northern)
Price : On request
More details- Manual Wafer Load Mask Aligner - 500W NUV Lamphouse - UV400 Optics (for 365 and 400nm exposures) - Can pro Year(s) : 2003 Location : EUROPE (Western and Northern)
Price : On request
More detailsMA6 Mask Aligner Location : EUROPE (Western and Northern)
Price : On request
More detailsProducer GT Year(s) : 2012 Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER SIZE 12 Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER SIZE 6 Year(s) : 1995 Location : EUROPE (Western and Northern)
Price : On request
More detailsNitride CVD Furnace Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsHigh K Metal CVD and ALD system, NiOx, HfOx process Version: 300 MM Vintage: 01.06.2012 Tokyo Electron Tria Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsEFEM Unit Only Version: 300 mm Vintage: 01.07.2006 DEINSTALLED AND WAREHOUSED CAN BE INSPECTED BY APPOINTMEN Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVersion: 200 MM Vintage: 01.05.1996 De-installed, warehoused. Can be inspected by appointment. Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.