Used Plasma Etcher / Asher
564 resultsWafer Inspection Tool Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
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More detailsTactrus NCCP, 300mm, Etch Connected in fab with 2 chms. Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)
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More detailsSLR ICP Shuttle Lock ICP Inductively Coupled Plasma Etch System. PC controller. Vacuum load lock with wafer tr Location : AMERICA North (USA-Canada-Mexico)
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More detailsSteag (AG Associates) Heatpulse 610 RTP Rapid Thermal Processing System. Manually loaded and capable of proce Location : AMERICA North (USA-Canada-Mexico)
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More detailsAccuthermo AW610 Rapid Thermal Processor. The AccuThermo AW610 is a rapid thermal processing (RTP) system, wh Location : AMERICA North (USA-Canada-Mexico)
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More detailsDry: Etching system/12in Year(s) : 2002 Location : ASIA (North East)
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More detailsPLASMA ETCHER MODEL PE11-B Location : AMERICA North (USA-Canada-Mexico)
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More details- Current Gas Configuration: H2, O2, N2, Ar, CF4, SF6, CHF3, He, CH4, Cl2 and BCl3 - Cryo Table w/ operatering Year(s) : 2009 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Current gas configuration: H2, O2, N2, Ar, CF4, SF6, CHF3, He, CH4 - Backup gases: Cl2 and BCl3 - Standard o Year(s) : 2009 Location : AMERICA North (USA-Canada-Mexico)
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More detailsMax Wafer: 200mm System Dimensions: 74x34x71 Configuration: 200mm platen, Load-locked single chamber, Ch Location : AMERICA North (USA-Canada-Mexico)
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More details- Load Locked Chamber - Carrier Plate to run batches of (qty 4) 150mm wafers per run - Carrier Plate to run b Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
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More detailsMetal Etcher Serial # 861 Configuration 6" system for metal etch Condition/Warranty As-is, where-is Location : AMERICA North (USA-Canada-Mexico)
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More detailsMetal Etch Serial # 869 Configuration 150 mm system for etching Metal Condition/Warranty As-is, where-is Location : AMERICA North (USA-Canada-Mexico)
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More detailsConfiguration and Wafer Size: One chamber with one Equipe PRI ATM-104-1 robot and ESC-200 controller; Location : AMERICA North (USA-Canada-Mexico)
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More details* T&c power Conversion INC 0313 RF power source * Seren MC3 automatic matching network controller * Seren RF Location : AMERICA North (USA-Canada-Mexico)
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More detailsAlcalic etcher, working direction right to left, Year(s) : 2004 Location : EUROPE (Western and Northern)
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More detailsHorizontal micro-etch line w/ flex transport, suitable for inner layers. Max. panel width: 650 mm, working dir Year(s) : 1999 Location : EUROPE (Western and Northern)
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More detailsEtch 11-A Plasma System with PD-IIA, Model PE11A, Serial# 401053, Technics PD-IIA, Serial# 403033 Location : AMERICA North (USA-Canada-Mexico)
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More detailsPLC controlled and offers real-time plain English readout of system operating parameters together with re Location : AMERICA North (USA-Canada-Mexico)
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More detailsAsher/Stripper Location : ASIA (North East)
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More details1994 Oxford Ionfab 300 Plus Ion Beam etching/deposition system SERIAL NUMBER 219574 THE TOOL HAD 4 MFCs, o Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)
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More detailsPlasma Etcher Plasma Etch Location : AMERICA North (USA-Canada-Mexico)
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More detailsBrand: Alcatel Alcatel 601E Deep Reactive Ion Etcher - Model 601HPE Deep Reactive Ion Etcher - Currently set Location : AMERICA North (USA-Canada-Mexico)
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More detailsBrand: Alcatel Alcatel 601E Deep Reactive Ion Etcher - Model 601E Deep Reactive Ion Etcher - Currently set u Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details<font face="arial"><small><b>MANUFACTURE: </b> Branson <b>MODEL/TYPE#: </b> L3100 ▬▬▬▬▬▬▬▬▬▬▬▬▬▬▬▬▬▬▬▬▬▬ <b>DE Year(s) : 1984 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XＳ5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.