Used CVD Equipment
217 results150mm Track Year(s) : 1992 Location : ASIA (North East)
Price : On request
More details150mm Track has missing parts Year(s) : 1991 Location : ASIA (North East)
Price : On request
More details150mm has missing parts Year(s) : 1997 Location : ASIA (North East)
Price : On request
More detailsILC-1012 Description PVD: Sputter Location : ASIA (North East)
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More detailsSRH820 Description PVD: Sputter Year(s) : 2006 Location : ASIA (North East)
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More detailsSV-9040-T14 Description PVD: Sputter Location : ASIA (North East)
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More details- Substrate Size Up To 4" - Max Temperature: 1100°C - Base Pressure:<10 - Process Gases: Argon, Hydrogen, Meth Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details<b>1x, Novellus, Concept 1 CVD</b> 200mm Location : AMERICA North (USA-Canada-Mexico)
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More detailsBrand: Applied Materials Model: P5000 CVD SYSTEM Specifications • Used • Description CVD System • Reference N Location : AMERICA North (USA-Canada-Mexico)
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More detailsSpecifications: Parallel plate 15" chamber Microprocessor controller 11" electrode 500 Watt @ Location : AMERICA North (USA-Canada-Mexico)
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More detailsFeatures: Capable of 100mm, 125mm, 150mm, and 200mm wafer processing Process extendibility from 0.5 mi Location : AMERICA North (USA-Canada-Mexico)
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More detailsSpecifications: Software version: 2.85.6 Process extendibility from 0.5 micron to 0.08 micron WJ-9 Location : AMERICA North (USA-Canada-Mexico)
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More detailsTISI ID 150901-72 Manufacturer TEL Model Alpha 8S Description LPCVD TEOS 1 System Wafer Size 200mm Vintag Location : ASIA (North East)
Price : On request
More detailsTISI ID 151012-175 Manufacturer Oxford Model Plasmalab800+PECVD Description PECVD Location : ASIA (North East)
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More detailsTISI ID 151012-176 Manufacturer Oxford Model Plasmalab800+PECVD Description PECVD Location : ASIA (North East)
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More detailsTISI ID 151012-177 Manufacturer Oxford Model Plasmalab800+PECVD Description PECVD Location : ASIA (North East)
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More detailsTISI ID 150917-01 Manufacturer TEL Model UNITY-EP Description Process Module 3 TiN/Ti-CVD Wafer Size 8" Location : ASIA (North East)
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More detailsBrand: WJ/Aviza TISI ID 150917-05 Manufacturer WJ/Aviza Model WJ-1000H-3.0 Description Atmosphere SiO2 CV Location : ASIA (North East)
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More detailsBrand: Quester Tech TISI ID 150917-07 Manufacturer Quester Tech Model APT-5850 Description Atm NSG CVD Wa Location : ASIA (North East)
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More detailsBrand: Quester Tech TISI ID 150917-06 Manufacturer Quester Tech Model APT-5850 Description Atm NSG CVD Wa Location : ASIA (North East)
Price : On request
More detailsTISI ID 51012-296 Manufacturer Oxford Model Plasmalab 800+PECVD Description PECVD Location : ASIA (North East)
Price : On request
More detailsTISI ID 151012-305 Manufacturer Oxford Model Plasmalab800+PECVD Description PECVD Location : ASIA (North East)
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More detailsTISI ID 150903-16 Manufacturer TEL Model Alpha-303i Description VF LPCVD AsPoly Wafer Size 300mm Location : ASIA (North East)
Price : On request
More detailsBrand: KE TISI ID 150903-122 Manufacturer KE Model DJ-835V Description VF LPCVD Poly (Undoped) Wafer Size Location : ASIA (North East)
Price : On request
More detailsTISI ID 150903-123 Manufacturer TEL Model Alpha-8S Description VF LPCVD Poly (Undoped/Low TEMP) Wafer Size Location : ASIA (North East)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.