Used Wafer Equipment
600 results13873 Wafer Mounter Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsM-2010 Wafer Washer Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsORIEL 87331 Mask Aligner Exposure Light 13157 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSP203 Mainunit: 6 Inch Bernoulli Handling; Pinlesschuck 6 Inch; Exhaust Up; 1 Medium Double Hex; 2 Medium Si Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsSP304 Mainunit: The system is equipped with 8-inch Bernoulli handling, Frontside and Backside (implemented by Year(s) : 2002 Location : EUROPE (Western and Northern)
Price : On request
More details• Infinity Corrected Objectives: Yes • Illumination Voltage: 12 V • Illumination Power: 100 W • Power Supply I Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAtmospheric wafer robot( DNS SU-3000) Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer inspection Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailsTEL ACT 8 COATER/DEVELOPER consisting of: - Model: CLEAN TRACK ACT 8 - Dual Block - Set up for 6” Wafers - 4 C Year(s) : 2020 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSOG Coater. Tool status: connected Wafer size: 200mm Fab section: thin film Vintage: 1998 Asset description: T Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER MOUNTER Vintage: 2020 Year(s) : 2020 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Clean 300mm Less than 200hrs Year(s) : 2017 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Sizes: 12"/300mm IMPLANT MC The VIISta 810 HP provides precise total incident angle and dosimetry contr Year(s) : 2018 Location : EUROPE (Western and Northern)
Price : On request
More detailsInstalled, Power On Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 200 mm Maximum 200 mm Condition Good CE Marked YES Exterior Dimensions Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsSUSS MICROTEC MJB3 MASK ALIGNER consisting of: - Model: MJB3 Main System - Manufacturer: Suss MicroTec Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsNIDEC SANKYO Corporation SR8220-01 WAFER SIZE 200mm Good condition. Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More detailsatmospheric wafer robot( DNS SU-3100) Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCondition: “As is” Date of manufacture: 2004 Wafer size 300mm Software revision : 3,280ST000 Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsSold in Good working Condition Location : EUROPE (Western and Northern)
Price : On request
More detailsAUTO WAFER MOUNTER SYSTEM MODEL RAD-2500F/12 Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsApplied Materials Axiom HT plus Axiom HT+ strip chamber Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsCompatible with a rectangular probe card with vertical probe (255mm x 114mm) - compatible CE marked or able t Location : EUROPE (Western and Northern)
Price : On request
More detailsSPEC IN IMAGES Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsIPEC Westech AVANTI 472 Chemical Mechanical Polisher Fully automated, single wafer IPEC polisher designed to a Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices