Used Semiconductor Equipment

<b> specification </b> Monitor 23-inch full HD (1920 x 1080 pixels) LCD monitor with 3D display function Phot Location : ASIA (North East)

Price : On request

【specification】 Monitor Color LCD (IPS type) 23-inch 3D display function available Photographing device (CCD) Location : ASIA (North East)

Price : On request

【specification】 ・Secondary electron image resolution: 3.0nm (acceleration voltage 30kV, high vacuum mode) 10n Location : ASIA (North East)

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【specification】 Marking method: XYZ3-axis simultaneous scanning method Mark Laser: YVO4 laser (class 4) Wave l Year(s) : 2017 Location : ASIA (North East)

Price : On request

Binocular Angle 45° Eyepieces Magnification 20 X Field Number 13 mm Focusing YES Objective Model Location : AMERICA North (USA-Canada-Mexico)

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Accessories Heated/vacuum work stage 5.25" X 5.75" with model 1201D power supply (see photo #10) Tool heat Location : AMERICA North (USA-Canada-Mexico)

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Binocular Angle 45° Eyepieces Magnification 20 X Focusing YES Magnification Range 18 X - 150 X Zo Location : AMERICA North (USA-Canada-Mexico)

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Inspection: Macro defect Year(s) : 2015 Location : ASIA (North East)

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2 CVD Chamber 6 inch complete ENI OEM-12B AMAT-0 chiller Location : EUROPE (Western and Northern)

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Diffusion LPCVD Nitride x01 Reactor Wafer Size 8 Location : EUROPE (Western and Northern)

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4 chambers Wafer Size 8,12 Year(s) : 2003 Location : EUROPE (Western and Northern)

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【specification】 Seal Character Direction Type: XYZ3-axis simultaneous scanning method Seal Character: YVO4 Las Year(s) : 2014 Location : ASIA (North East)

Price : On request

【specification】 ・Printing laser: Yb: fiber laser class 4 laser Laser wavelength: 1060nm Average output: 25W (p Location : ASIA (North East)

Price : On request

【specification】 Observation method Epi-illumination: bright field, dark field, differential interference obse Location : ASIA (North East)

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Brand Mitaka Kohki Non-contact 3D measuring device 【Main Specifications】 〇Microscope section ・Expensive obser Location : ASIA (North East)

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Surface roughness measuring machine Year: Model: 2011 Measurement range/resolution: Z axis 800μm/0.01μm, 80 Year(s) : 2011 Location : ASIA (North East)

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○Main specifications ・Product configuration: Atmospheric pressure plasma unit (Type FPE), plasma irradiation r Year(s) : 2015 Location : ASIA (North East)

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Measurement range: X-axis 100mm Z1-axis detection section ±30mm from horizontal state Z2 axis (column) movem Location : ASIA (North East)

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Year: Model: 2015 Tilt mechanism: Yes (X axis, tilt angle ±45 degrees) Measurement range/resolution: X-axis 20 Year(s) : 2015 Location : ASIA (North East)

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Lithography Coater and Developer Manufacturer: Sokudo Version: 300 mm Deinstalled and warehoused. Can be insp Location : AMERICA North (USA-Canada-Mexico)

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Automated Photoresist Coater Version: 200 mm Location : AMERICA North (USA-Canada-Mexico)

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Strip Etch Tinstrip line, line length 18,1m, direction R-L, max working width 650mm, max panel 640mm x 532mm, Year(s) : 2006 Location : EUROPE (Western and Northern)

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microscope has been rebuilt to the original OEM specifications and comes complete with a Schottky emitter that Location : AMERICA North (USA-Canada-Mexico)

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100KV W or LaB6 Compustage and a single tilt holder Location : AMERICA North (USA-Canada-Mexico)

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Equipped with Magnum ion Column SFEG UHR SEM STEM capable! 5 axis stage with 100 x 100 mm XY Turbo vacuum 2 GI Location : AMERICA North (USA-Canada-Mexico)

Price : On request