Tepla 600-AL

– Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds
– Chamber Size: 245mm diameter, 380mm depth
– Chamber Material: ceramic
– ENI RF Generator: 0-600 Watt, 13.56 MHz
– Semi-Automatic RF Plasma System
– Can process up to 200mm wafers
– Gases: 4 channels controlled by 4 MFCs
– Leybold D65B Vacuum Pump
– Dimensions: 740mm x 624mm x 701mm + connections
– Electrical: 230V, 50/60Hz, 15A, 2kW

The item is only for end users. It is subject to prior sales without notice. Appreciate your time.
Please visit our website for our main refurbished equipment at https://www.semistarcorp.com/product-category/refurbished-hot-items/

SemiStar Corp. provides the following plasma asher, plasma descum, plasma clean, dry clean equipment at complete, working, functional test or refurbished condition with OEM specifications, warranty and installation (optional).

Branson/IPC 3000

Branson/IPC L3200

Gasonics L3510

Gasonics Aura 3010

Gasonics Aura 1000

Gasonics Aura 3000

Gasonics Aura 2000

Matrix 105

Matrix 205

Matrix 209S

March PX-250

AST Barrel Asher

PlasmaEtch PE-100

Plasma Etch BT1

Technics 2000

Technics PE-IIA